发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND IMAGE FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition so excellent in shelf stability as not to cause image defects due to the crystallization of a UV absorbent precursor even when the composition is held in an environment at a high temperature. SOLUTION: The photosensitive resin composition contains a UV absorbent precursor of formula 1 (where R1-R6 are each alkyl or aryl and R7-R9 are each H or alkyl) convertible to a UV absorbent when a group protected by a protective group is deprotected by heating, a crystallization inhibitor of the UV absorbent precursor, a photopolymerization initiator, a polymerizable monomer and a binder. The crystallization inhibitor is preferably at least one of triazine type, benzotriazole type and hindered amine type UV absorbents.
申请公布号 JP2001235856(A) 申请公布日期 2001.08.31
申请号 JP20000046125 申请日期 2000.02.23
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKASHIMA MASANOBU;ITO HIDEAKI;INOUE KOJI
分类号 G03F7/004;C08F2/44;C08F2/50;C08K5/3435;C08K5/3492;C08K5/3495;C08L101/00;G03F7/027;G03F7/028;G03F7/032;G03F7/40 主分类号 G03F7/004
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