PHOTOMASK, EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photomask which is transferred with the pattern in an effective pattern region and is capable of transferring dummy patterns to the circumference of an exposure object, an exposure device and an exposure method as well as a method for manufacturing a semiconductor device utilizing this photomask. SOLUTION: The photomask 200 has the effective pattern region 210 and the dummy pattern regions 220 disposed at least in part of the circumference of the effective pattern region 210. The dummy pattern regions 220 are formed along the outer circumference of the effective pattern region 210. A light shielding zone 230 is disposed between the effective pattern region 210 and the dummy pattern regions 220.