| 摘要 |
PROBLEM TO BE SOLVED: To measure plasma characteristics correctly by preventing a reaction product in plasma from adhering to a probe surface. SOLUTION: A plasma measurement equipment consists of a probe loaded into the plasma which is an object to be measured, a high frequency power supply for impressing high frequency to the probe, a voltmeter which measures the voltage of the probe, an ammeter which measures the high frequency current which flows to a probe, and a data-processing device which presumes the plasma characteristic from the high frequency current voltage. In stead of the direct- current voltage current characteristic, by using the high frequency voltage current characteristic, the plasma measurement which cannot easily receive disturbance of the fluctuate condition on the surface of the probe is attained. |
