| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to solve a problem that a reactive product in plasma is attached to a surface of a probe, and a plasma characteristic can not be measured correctly in a conventional measuring technique, in which a DC voltage is applied to the probe for plasma characteristic measurement, a current carried from plasma is measured, and plasma characteristics are measured from the current/voltage characteristics. SOLUTION: The plasma treatment apparatus includes a probe mounted in plasma to be measured, a high frequency power supply for applying a high frequency to the plasma, a voltmeter for measuring the voltage in the probe, an ammeter for measuring the high frequency current carried in the probe, and a data processor for estimating the plasma characteristics from the high frequency current/voltage. By using the high frequency current/voltage characteristics instead of DC current/voltage characteristics, plasma measurement can be carried out with small influence from outer distrubance that is hardly affected by a disturbance in surface conditions of the probe. |
