发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) a compound of formula 1 [where Z is an n-valent hydrocarbon group having an alicyclic carbon ring in which the total number of ring forming carbon atoms is 4-20 or its derivative and (n) is an integer of 1-4]. |
申请公布号 |
JP2001235862(A) |
申请公布日期 |
2001.08.31 |
申请号 |
JP20000044179 |
申请日期 |
2000.02.22 |
申请人 |
JSR CORP |
发明人 |
DOUKI KATSUJI;KAJITA TORU;SHIMOKAWA TSUTOMU |
分类号 |
G03F7/039;C08F220/06;C08F220/10;C08F222/06;C08F232/08;C08K5/103;C08L33/02;C08L33/04;C08L35/00;C08L45/00;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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