| 摘要 |
PURPOSE: An exposure method and device, method of manufacturing the same device are provided to facilitate the assembling and adjustment of a stage system and to conduct them efficiently. CONSTITUTION: After assembling a frame mechanism(32-37) from a surface plate(32), column(33), support plates(35,37), sub-chambers(9,19), each provided with a lighting system are installed and a projection optical system(PL) is mounted on the support plate(37). In parallel with this job, a reticle chamber(23) and reticle stage system(RST) is assembled and adjusted, and at the same time, a wafer chamber(38) and wafer stage system(WST) is assembled and adjusted. The reticle chamber(23) and the wafer chamber(38) are assembled into the frame mechanism(32-37) mounted with the projection optical system(PL) by a module method, Inside the reticle chamber(23), wafer chamber(38), etc., pipes and the like are laid to supply a purge gas, through which exposure light is passed. A space or the like between the projection optical system(PL) and the wafer chamber(38) is sealed by a flexible film-like soft shielding member(18D) or the like.
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