| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive composition excellent in developability (particularly reduction of residue on development and development defects) and excellent also in sensitivity, resolving power and the shape of pattern profile. SOLUTION: The positive photosensitive composition contains a compound which generates an acid when irradiated with active light or radiation, a resin which is decomposed by the action of the acid to increase its solubility in an alkali developing solution and an N,N-dialkylcarboxylic acid amide. |
