发明名称 EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To independently check the aligment marks of a mask and work respectively separately with a CCD camera and to respectively movably set the alignment points of the mask and the alignment points of the work. SOLUTION: The exposure method for executing exposure by checking the alignment marks 6 of the mask 4 and the alignment marks 5 of the one-side substrate (work) 10 with the CCD camera 8, executing the alignment and irradiating the work with exposure rays from the mask 4 side consists is disposing the mask 4 and the one-side substrate (work) 10 in such a manner that the alignment marks 6 of the mask 4 exist on the outer side at the outer edge of the one-side substrate (work) 10 opposite to each other, and aligning the mask 4 and the one-side substrate (work) 10 by respective separately checking the alignment marks 6 and 5 of the mask 4 and the one-side substrate (work) 10 with the CCD camera 8.
申请公布号 JP2001235877(A) 申请公布日期 2001.08.31
申请号 JP20000013973 申请日期 2000.01.18
申请人 SONY CHEM CORP 发明人 HIKICHI TAKASHI;FUKUDA MASAHIRO
分类号 H05K3/00;G03F9/00;(IPC1-7):G03F9/00 主分类号 H05K3/00
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