| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material which ensures improved antistatic property, scuffing resistance and sticking property and suppresses the contamination of a processing solution under low replenishment and a processing method for the photosensitive material. SOLUTION: In the silver halide photographic sensitive material with a silver halide emulsion layer and a non-photosensitive colloidal layer on each of both faces of the base, a compound of formula 1 and a polyalkylene oxide type nonionic surfactant of the formula R21-A-(B)n21-R20 are contained in at least one of the layers.
|
