发明名称 SUBSTRATE HAND, CARRIER DEVICE, INSPECTION DEVICE, AND FLAT SUBSTRATE ACCOMMODATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a carrier device that can prevent wafers from being damaged while the wafers are being carried. SOLUTION: This carrier device is composed of a hand 5 that grips a wager W so that a substrate surface becomes vertical, and a carrier robot 4 that performs conveyance so that the substrate surface of the wafer W is in parallel with a wafer movement direction, and the surface of the wafer that is vertically retained by the hand 5 is observed by a microscope having an objective lens 3a where a light axis J is horizontal, thus preventing the wafer W from being damaged without allowing the wafer W to bend by dead weight and air resistance in the conveyance. In addition, the observation is made while the wafer W is retained by the band 5, thus reducing the number of times for delivering the wafer in an inspection process, and hence reducing wafer damage when the wafer is delivered.
申请公布号 JP2001237306(A) 申请公布日期 2001.08.31
申请号 JP20000048660 申请日期 2000.02.25
申请人 NIKON CORP 发明人 SHIBATA HIROMASA
分类号 B65G49/06;B25J15/08;B65G49/07;H01L21/66;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/06
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