| 摘要 |
PROBLEM TO BE SOLVED: To provide an Si wafer checking device and the Si wafer checking method which can surely check cracks on the Si wafer. SOLUTION: A first airtight pad 4 which is provided in an upper chamber 2 and a second airtight pad 5 which is provided in a lower chamber 3 are firmly fixed in the front and rear surfaces of an Si wafer 13, and a first valve 9 which is provided on a gas introducing tube 8 and a second valve 12 which is provided in a gas exhausting tube 11 are released. Helium gas flows out from a vessel 7 and is supplied to a space between the upper chamber 2 and the Si wafer 13. When a vacuum pump which is contained in a helium gas detector 10 is driven, air in the space between the lower chamber 3 and the Si wafer 13 is exhausted. In case a crack is formed on the Si wafer 13, helium gas is detected by the helium gas detector 10 via the gas exhausting tube 11.
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