发明名称 SPUTTERING TARGET FOR MANUFACTURING MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM BY USING THE SAME, AND MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target so as to prevent abnormal discharge caused by forming a granular magnetic layer of a magnetic recording medium and to prevent production of foreign matters on the magnetic recording medium accompanied by abnormal discharge, to provide a method of manufacturing a magnetic recording medium by using that target, and to provide a magnetic recording medium obtained by that method. SOLUTION: The sputtering target for the manufacture of a magnetic recording medium is used to form a magnetic layer of a magnetic recording medium having at least a nonmagnetic base layer, magnetic layer and protective layer successively formed on a nonmagnetic substrate. The sputtering target consists of a mixture of metals and oxides, and the particle diameter of the oxides in the sputtering target is <=10μm.
申请公布号 JP2001236643(A) 申请公布日期 2001.08.31
申请号 JP20000046471 申请日期 2000.02.23
申请人 FUJI ELECTRIC CO LTD 发明人 UWAZUMI HIROYUKI;OIKAWA TADAAKI
分类号 C22C5/04;C23C14/06;C23C14/34;G11B5/64;G11B5/65;G11B5/851;H01F41/18;(IPC1-7):G11B5/851 主分类号 C22C5/04
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