发明名称 |
SPUTTERING TARGET FOR MANUFACTURING MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM BY USING THE SAME, AND MAGNETIC RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target so as to prevent abnormal discharge caused by forming a granular magnetic layer of a magnetic recording medium and to prevent production of foreign matters on the magnetic recording medium accompanied by abnormal discharge, to provide a method of manufacturing a magnetic recording medium by using that target, and to provide a magnetic recording medium obtained by that method. SOLUTION: The sputtering target for the manufacture of a magnetic recording medium is used to form a magnetic layer of a magnetic recording medium having at least a nonmagnetic base layer, magnetic layer and protective layer successively formed on a nonmagnetic substrate. The sputtering target consists of a mixture of metals and oxides, and the particle diameter of the oxides in the sputtering target is <=10μm. |
申请公布号 |
JP2001236643(A) |
申请公布日期 |
2001.08.31 |
申请号 |
JP20000046471 |
申请日期 |
2000.02.23 |
申请人 |
FUJI ELECTRIC CO LTD |
发明人 |
UWAZUMI HIROYUKI;OIKAWA TADAAKI |
分类号 |
C22C5/04;C23C14/06;C23C14/34;G11B5/64;G11B5/65;G11B5/851;H01F41/18;(IPC1-7):G11B5/851 |
主分类号 |
C22C5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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