发明名称 METHOD FOR DEVELOPING PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a development processing device for photosensitive materials capable of lessening the amount of waste liquids while maintaining the developing performance of a development processing liquid. SOLUTION: The developing method for developing the exposed photosensitive materials 9 while holding the development activity of a developer L by using the development processing device 10 having a developing bath 4 is characterized in that the holding of the development activity is executed by subjecting the developer L to an electrolytic treatment on the cathode side of an electrolytic cell 1 in this electrolytic cell 1 and replenished the developer in a developing bath with a development replenishing liquid; the electrolyte treatment is executed by detecting the activity of the developer in the developing bath 4 and according to the detected value thereof; the replenishing of the development replenishing liquid corresponds to the processing amount of the photosensitive materials 9 and the working tome of the development processing device 10 and the correspondence thereof is regulated according to the property values of the waste developer introduced to the anode side of the electrolytic cell 1.
申请公布号 JP2001235876(A) 申请公布日期 2001.08.31
申请号 JP20000043135 申请日期 2000.02.21
申请人 FUJI PHOTO FILM CO LTD 发明人 FURUKAWA KOJI
分类号 G03F7/30;(IPC1-7):G03F7/30 主分类号 G03F7/30
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