| 摘要 |
PROBLEM TO BE SOLVED: To realize a scrub cleaning device which is enhanced in cleaning efficiency, performance, and maintainability. SOLUTION: A scrub cleaning device is equipped with a wafer rotating/ holding means 1 which rotates a wafer W while holding it nearly in a vertical position, a brush means 2 which scrubs the one side or both the sides of the wafer W while rotating on its own axis. The brush means 2 is formed like a bottomed cylinder consisting of a rotary shaft member 21 provided with a large number of liquid-passing holes 25 bored in its wall surface, and a brush member 22 mounted on the outer wall surface of the rotary shaft member 21. A cleaning liquid is supplied from a liquid feed means 3 into the cylinder through the one opening 21a of the rotary shaft member 21, and discharged out through the liquid passing holes 25 passing through the brush member 22.
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