发明名称 SELECTIVE SHIELD CHARACTERISTIC FILM AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a selective shield characteristic film, as well as manufacturing method thereof, of good selective shield characteristic and industrial productivity by employing a specific means wherein a conductive layer such as a metal thin layer between two film layers is irradiated with laser beam so that a slit channel is formed with no damage on both films. SOLUTION: A laminated sheet, wherein a conductive inorganic thin layer (3) such as silver is provided between a first film layer (1) and a second film layer (2), is scanned with laser beam so that such a conductive inorganic thin layer (3) at a part where the laser beam is projected is removed, forming a slit channel (g). Thus, the conductive inorganic thin layer (3) is divided into specified-shaped regions. The laser beam is scanned in such a condition as neither the first film layer (1) nor the second film layer (2) is broken at formation of the slit channel (g).
申请公布号 JP2001237590(A) 申请公布日期 2001.08.31
申请号 JP20000047987 申请日期 2000.02.24
申请人 OSAKA PREFECTURE;NIPPON PAINT CO LTD;MEIWA PAX CO LTD 发明人 NAGATA ITSUO;MATSUO SEIICHI;ITO YOSHIBUMI
分类号 E04B1/92;H05K9/00;(IPC1-7):H05K9/00 主分类号 E04B1/92
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