METHOD AND APPARATUS FOR LEAK DETECTING, AND APPARATUS FOR SEMICONDUCTOR MANUFACTURE

摘要

Components of extracted gas are analyzed by a Fourier transform infrared spectrometer (28) to determine whether more than a predetermined quantity of at least one kind of particular gases is included in the analyzed gas. When more than the predetermined quantity of at least one kind of the particular gases is included in the mixed gas, a controller (30) supplies a control/display monitor (31) with a signal indicative of leakage of the particular gas. According to this method, any kind of gas can be detected accurately irrespective of the kinds of leaking gas.