| 摘要 |
To provide a lamp annealing apparatus, which prevents cloud of a reflector, achieves stability of temperature for heat-treatment and prevents oxidization of a front surface of a semiconductor wafer. The lamp annealing apparatus includes a lamp unit 1 for heating at an upper portion of a chamber 10 and a reflector 7a for stabilizing temperature at a lower portion of the chamber 10. Process gas is supplied to a side of a front surface 21 of a semiconductor wafer 2 located and rotated on a rotating cylinder 4 in the chamber 10, and rear face gas for preventing cloud of the reflector 7a is supplied to a side of a rear surface 22 of the semiconductor wafer 2. There are further included mass flow controllers 15a to 15d for mixing gases to obtain a desire rear face gas. The rear face gas is turned around the periphery of the reflector 7a to be exhausted.
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