| 摘要 |
PURPOSE: A method of developing a wafer is to prevent generation of pattern collapse phenomena, while maintaining a thickness of a photoresist. CONSTITUTION: When a wafer(21) is placed in a development apparatus, a developing solution is uniformly sprayed on the wafer, while rotating it. The rotation of the wafer is stopped and kept for a prescribed development time to develop the wafer. The wafer is then dipped into a water bath(26) including a rinse solution(25) and is rotated in the bath to remove a residue remaining thereon. The rinsed wafer is taken out of the water bath and then baked in a bake oven to remove the rinse solution.
|
