SEMICONDUCTOR MANUFACTURING SYSTEM FOR PERFORMING PROCESS BY SUPPLYIDING PROCESS GAS INTO TUBE

摘要

PURPOSE: A semiconductor manufacturing system for performing a process by supplying a process gas into a tube is provided to form uniformly thickness of a layer formed on a wafer by supplying constantly a process gas. CONSTITUTION: An LPCVD(Low Pressure Chemical Vapor Deposition) system(10) has an internal tube(30) and an external tube(20). A boat(40) is installed within the internal tube(30) in order to load a wafer. A nozzle(50) and an outlet tube(60) are installed at a lower portion of the LPCVD system(10). A process gas is provided to the LPCVD system(10) through the nozzle(50). The outlet tube(60) exhausts the process gas from the LPCVD system(10) to the outside. A projection(36) is formed at an inner wall(32) of the internal tube(30). A flow direction of the process gas is controlled by the projection(36).