METHOD FOR CHECKING MIS-ALIGNMENT

摘要

PURPOSE: A method for checking misalignment is provided to improve the reliability by setting up a position of a KLA key for an in-box key and an out-box key to an auto mode. CONSTITUTION: A reticle is loaded on a reticle table of an exposure system. A wafer coated with a photoresist is supported by a wafer stage. A parameter is inputted(S60). A reticle alignment process is performed(S70). A reference eye point process is performed(S80). A wafer map check process is performed(S90). An in-box key and an out-box key are set up by selecting a position of a KLA key to an auto mode on a software in a create new test process(S100).