发明名称 |
RESIST PEELING APPARATUS AND RESIST PEELING LIQUID MANAGEMENT METHOD, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME SEMICONDUCTOR |
摘要 |
PURPOSE: To maintain the element ratio of a resist peeling liquid to the adequate range for a long period of time in the resist for peeling resist residues adhered to a semiconductor wafer using a resist peeling liquid consisting of multiple elements. CONSTITUTION: A peeling liquid tank 14 is provided to store the resist peeling liquid. A conductivity monitor 46 is provided to monitor the conductivity of the resist peeling liquid. An additional element tank 50 is also provided to estimate the element ratio of the resist peeling liquid based on such conductivity, and adds the adequate amount of resist peeling liquid based on the estimation result to cover the shortage of such resist peeling liquid.
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申请公布号 |
KR20010081948(A) |
申请公布日期 |
2001.08.29 |
申请号 |
KR20000062576 |
申请日期 |
2000.10.24 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
HORI YOSHIYUKI;MURANAKA SEIJI;TANAKA HIROSHI |
分类号 |
G03F7/30;G03F7/42;H01L21/00;H01L21/027;H01L21/304;H01L21/306;H01L21/311;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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