发明名称 |
BAKER UNIT OF PHOTO-LITHOGRAPHY SYSTEM |
摘要 |
PURPOSE: A baker unit of a photo-lithography system is provided to sense a state of a wafer by installing a sensor at a plate oven. CONSTITUTION: A chamber(50) is prepared to form an airtight space. A panel(51) is installed at an outer side of the chamber(50). A plate oven is installed an inside of the chamber(50). A heating source for heating a wafer(70) is formed at an inside of the plate oven(60). A projection face(61) is formed on an upper face of the plate oven(60). The wafer(70) is loaded on the projection face(61). A multitude of guide(63) is prepared to prevent escape of the wafer(70). A sensor(67) is formed on the projection face(61) to sense a state of the loaded wafer(70).
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申请公布号 |
KR20010081743(A) |
申请公布日期 |
2001.08.29 |
申请号 |
KR20000007843 |
申请日期 |
2000.02.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, GYU SEUNG |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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