发明名称 Photosensitive compound and photosensitive resin
摘要 <p>The invention provides a photosensitive compound which can be used to prepare a photosensitive resin, and a photosensitive resin obtained from the compound. The compound has a moiety represented by formula (I) or (II): &lt;CHEM&gt; &lt;CHEM&gt; wherein R&lt;1&gt; represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group; Y is selected from the following formula groups: &lt;CHEM&gt; wherein each of R&lt;2&gt; and R&lt;3&gt; represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, and 1 is an integer of 1 to 5; and Ar is selected from the following formula groups: &lt;CHEM&gt; &lt;CHEM&gt; wherein X represents lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, trialkylammonium, or tetraalkylammonium.</p>
申请公布号 EP1128214(A1) 申请公布日期 2001.08.29
申请号 EP20010103264 申请日期 2001.02.12
申请人 TOYO GOSEI KOGYO CO., LTD. 发明人 TADA, KENTARO;SHIBUYA, TORU
分类号 C07D277/20;C07D277/36;C08F8/30;G03F7/00;G03F7/008;G03F7/012;(IPC1-7):G03F7/012;C08F116/38 主分类号 C07D277/20
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