发明名称 |
RESIST PATTERN FORMING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND APPARATUS FOR REMOVING ORGANIC ANTIREFLECTION FILM |
摘要 |
PURPOSE: To provide a so improved resist pattern forming method as to enhance the dimensional accuracy of a resist pattern. CONSTITUTION: An organic antireflection film 503 is formed on a semiconductor substrate 501. A resist 504 is formed on the substrate 501 by way of the antireflection film 503. The resist 504 is patterned to form a resist pattern 508 having an opening. Part of the antireflection film 503 disclosed at the bottom of the opening of the resist pattern 508 is removed with atomic oxygen. |
申请公布号 |
KR20010081950(A) |
申请公布日期 |
2001.08.29 |
申请号 |
KR20000063491 |
申请日期 |
2000.10.27 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
ITO JIRO |
分类号 |
G03F7/11;G03F7/40;H01L21/027;H01L21/266;H01L21/302;H01L21/3065;H01L21/311;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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