| 摘要 |
An exposure apparatus with an autofocus control system, wherein a focusing mark formed on an original is illuminated with light of the same wavelength as that of exposure light, so that an image thereof is projected through a projection optical system onto a reflection surface provided at a predetermined position on a substrate stage, wherein the light reflected therefrom is received through the projection optical system and the original, and wherein this operation is repeated at different positions along an optical axis direction, an the basis of which the image plane position of the projection optical system is detected. During this projection, the substrate stage is moved continuously along the optical axis direction, and at different positions the reflection surface is detected while, on the other hand, reflected light from the focusing mark image is received by a light receiving system, in synchronized timing.
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