发明名称 Method for synthesizing single crystal AIN thin films of low resistivity n-type and low resistivity p-type
摘要 In growing single AlN thin films on a semiconductor substrate by rapidly cooling a beam of atomic Al and atomic or molecular N obtained by exciting or decomposing N2 with an electromagnetic wave on the semiconductor substrate, an n-type dopant and a p-type dopant in the form of atomic beams are simultaneously doped in a crystal, so that pairs of an n-type dopant and a p-type dopant are formed in the crystal to synthesize single crystal AlN thin films of low resistivity n-type and low resistivity p-type.
申请公布号 US6281099(B1) 申请公布日期 2001.08.28
申请号 US20000486946 申请日期 2000.03.06
申请人 JAPAN SCIENCE AND TECHNOLOGY CORPORATION 发明人 YOSHIDA HIROSHI
分类号 C30B29/38;C30B23/02;C30B31/20;H01L21/203;H01L21/205;H01L21/263;(IPC1-7):H01L21/20 主分类号 C30B29/38
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