发明名称 |
Target misalignment detector |
摘要 |
A method and apparatus for detecting target misalignment and plasma instability in a sputtering chamber in a semiconductor fabrication system is provided. In certain embodiments, a detector is utilized to monitor the voltage of the power applied to bias the target. If the voltage fluctuates excessively, plasma instability and target misalignment is indicated.
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申请公布号 |
US6280579(B1) |
申请公布日期 |
2001.08.28 |
申请号 |
US19980123507 |
申请日期 |
1998.07.28 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LEE SEH KWANG;EGERMEIER JOHN |
分类号 |
C23C14/34;C23C14/56;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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