| 摘要 |
<p>PROBLEM TO BE SOLVED: To shorten a polishing time to perform polishing efficiently, provide high precision, and reduce cost in a polishing method for performing precise polishing using abrasive grains. SOLUTION: After polishing a substrate using free abrasive grains 10 mainly, polishing liquid 13 containing diamond abrasive grains having a larger particle diameter than that used in the substrate polishing is supplied to a polishing face 1a of the same surface plate as a polishing surface plate 1 used for substrate polishing, both of them are relatively slid while a correction ring 6 is brought into contact with the polishing face 1a, and a part of the free abrasive grains 10 is embedded into the polishing face 1a to form fixed abrasive grains 11 in order to polish a workpiece by the fixed abrasive grains 11.</p> |
