发明名称 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
摘要 A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation.wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by - (CH2)m-(m is an integer of 3 to 9), and R14 is a hydrophilic group.
申请公布号 US6280897(B1) 申请公布日期 2001.08.28
申请号 US19970997623 申请日期 1997.12.23
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ASAKAWA KOJI;KIHARA NAOKO;SHIDA NAOMI;USHIROGOUCHI TORU;OKINO TAKESHI;NAKASE MAKOTO;NAITO TAKUYA;SAITO SATOSHI
分类号 G03F7/004;G03F7/038;(IPC1-7):G03F7/004;G03F7/30 主分类号 G03F7/004
代理机构 代理人
主权项
地址