发明名称 |
METHOD FOR PRODUCING MICROMECHANICAL DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To establish an anode joining method completely preventing air from being taken in when carrying out the anode joining to improve the joining yield and to provide a joining method with high reliability. SOLUTION: This method for carrying out the anode joining of a glass with a silicon wafer or a metal surface is characterized in that the anode joining is carried out in vacuum, and the degree of the vacuum when carrying out the anode joining is regulated so as to be 1 Torr or less.
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申请公布号 |
JP2001233640(A) |
申请公布日期 |
2001.08.28 |
申请号 |
JP20010020397 |
申请日期 |
2001.01.29 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SHIMIZU NOBUO;NOSE YASUTO;KAMISUKE SHINICHI;YOTSUYA SHINICHI |
分类号 |
C03C27/02;C03C27/00;(IPC1-7):C03C27/02 |
主分类号 |
C03C27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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