发明名称 Manufacturing method for nitride III-V compound semiconductor device using bonding
摘要 In a semiconductor device manufacturing method capable of manufacturing semiconductor lasers, light emitting diodes or electron transport devices using nitride III-V compound semiconductors with a high productivity, a GaN semiconductor laser wafer is prepared in which a plurality of semiconductor lasers are formed on an AlGaInN semiconductor layer on a c-face sapphire substrate and separated from each other by grooves deep enough to reach the c-face sapphire substrate, and a p-side electrode and an n-side electrode are formed in each semiconductor laser. The GaN semiconductor laser wafer is bonded to a photo-diode built-in Si wafer having formed a photo diode for monitoring light outputs and solder electrodes in each pellet by positioning the p-side electrode and the n-side electrode in alignment with the solder electrodes, respectively. After that, by lapping the c-face sapphire substrate from its bottom surface deep enough to reach the grooves or by dicing the c-face sapphire substrate from its bottom surface, the semiconductor lasers on the photo-diode built-in Si wafer are separated from each other. After that, the photo-diode built-in Si wafer is divided by dicing into discrete pellets. A GaN semiconductor laser chip, thus obtained, is assembled on a package.
申请公布号 US6281032(B1) 申请公布日期 2001.08.28
申请号 US19990291016 申请日期 1999.04.14
申请人 SONY CORPORATION 发明人 MATSUDA OSAMU;KOBAYASHI TOSHIMASA;NAKAYAMA NORIKAZU;KAWAI HIROJI
分类号 H01L21/301;H01L21/02;H01L21/18;H01L21/20;H01L21/338;H01L21/8252;H01L29/812;H01L31/0232;H01L33/48;H01S5/00;H01S5/02;H01S5/323;H01S5/343;(IPC1-7):H01L21/00 主分类号 H01L21/301
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