发明名称 PRESSURE EMBEDDING TREATING DEVICE FOR SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To prevent floating of particles (dust) in a treating chamber when the treating chamber of a pressure container is evacuated (gas replaced). SOLUTION: The treating chamber 12 is formed of the pressure container 4 and upper and lower covers 8, 9 thereof. A valve means 27 for evacuating the chamber 12 is provided at the cover 9.
申请公布号 JP2001230249(A) 申请公布日期 2001.08.24
申请号 JP20000039901 申请日期 2000.02.17
申请人 KOBE STEEL LTD 发明人 MASUDA KOJI;ISHII TAKAHIKO;NARUKAWA YUTAKA
分类号 H01L21/677;H01L21/3205;H01L21/68;(IPC1-7):H01L21/320 主分类号 H01L21/677
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