发明名称 |
PRESSURE EMBEDDING TREATING DEVICE FOR SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To prevent floating of particles (dust) in a treating chamber when the treating chamber of a pressure container is evacuated (gas replaced). SOLUTION: The treating chamber 12 is formed of the pressure container 4 and upper and lower covers 8, 9 thereof. A valve means 27 for evacuating the chamber 12 is provided at the cover 9. |
申请公布号 |
JP2001230249(A) |
申请公布日期 |
2001.08.24 |
申请号 |
JP20000039901 |
申请日期 |
2000.02.17 |
申请人 |
KOBE STEEL LTD |
发明人 |
MASUDA KOJI;ISHII TAKAHIKO;NARUKAWA YUTAKA |
分类号 |
H01L21/677;H01L21/3205;H01L21/68;(IPC1-7):H01L21/320 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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