| 摘要 |
PROBLEM TO BE SOLVED: To provide a scanning aligner and a scanning alignment method by which a moving distance for stepping from a previous shot area to next shot area accompanied with a line change can be shortened and a whole throughput be improved as a result. SOLUTION: This scanning device is provided with a reticle stage 6 to move a reticle R whereon a pattern for transfer is formed and a wafer stage 1 to move a wafer W wherein the pattern of the reticle R is exposed. When the pattern of the reticle R is successively transferred and exposed in the respective shot areas of the wafer W by synchronously scanning the reticle R and wafer W by means of the reticle stage 6 and wafer stage 1, a line change detection part 22 is provided to detect whether or not the stepping from the previous shot area to the alignment start position of the next shot area is accompanied with a line change, and a stage control means or a stage control step is also provided to control the wafer stage 1 according to the position of the next shot area on the basis of the detected value of the detection part 22 and to move the wafer W to the alignment position. |
