发明名称 SUPPORTING DEVICE
摘要 PROBLEM TO BE SOLVED: To improve precision of a fine adjustable stage. SOLUTION: This supporting device is provided with a control means which positionally controls a wafer stage top plate 12 on which a wafer W is placed, to an X stage top plate 11 and an L-shaped plate spring 5 supporting a self weight of the wafer stage top plate 12. The leaf spring 5 is provided with a tip end 5b as a flexible element for reducing a restoring force to the change of the wafer stage top plate 12 in the vertical plate in the direction of gravity, and it is also provided with an adjustable joint 6 which freely slides the wafer stage top plate 12 at least in the direction of rotation and gravity to the X stage top plate 11 and limits the degree of freedom in the vertical plane in the direction of the gravity, and then the plate spring 5 is arranged around the adjustable joint 6.
申请公布号 JP2001230173(A) 申请公布日期 2001.08.24
申请号 JP20000039837 申请日期 2000.02.17
申请人 CANON INC 发明人 KORENAGA NOBUSHIGE
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址