发明名称 METHOD FOR MANUFACTURING INK JET PRINTER HEAD
摘要 PROBLEM TO BE SOLVED: To improve working shape accuracy in the case of working a silicon substrate by anisotropical etching using an alkali liquid. SOLUTION: A method for manufacturing an ink jet printer head comprises the steps of eliminating a thinner part of an SiO2 film by sequentially etching during etching of the silicon substrate by using the SiO2 film having a part having a different thickness as an etching mask, in a working step for forming a groove, a through hole, a diaphragm or the like on the substrate by anisotropically etching using the alkali liquid, and continuously etching the silicon of the substrate to the eliminated SiO2 film to form a structure having a plurality of depths on the substrate.
申请公布号 JP2001230241(A) 申请公布日期 2001.08.24
申请号 JP20000392487 申请日期 2000.12.25
申请人 SEIKO EPSON CORP 发明人 KAMISUKE SHINICHI;SHIMIZU NOBUO
分类号 B41J2/16;H01L21/308;(IPC1-7):H01L21/308 主分类号 B41J2/16
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