| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for keeping a production history information of semiconductor device by which the production history information can be kept easily. SOLUTION: In a contact formation step (ST3), a production history information area 5 in each of chips 2 is simultaneously exposed with an aligner by means of a master mask, so that a hole for connecting transistors in the respective production history information area 5 is formed in an insulation layer. Thus, a exposing step can be completed by one-time processing using one master mask, and the step be also made to be simple and easy, and furthermore, the production history information can be kept easily. |
