| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical solution treatment method by which the uniformity of processing with a chemical solution is enhanced by moving the chemical solution on a substrate to be treated without direct contact with the chemical solution. SOLUTION: The chemical solution treatment method includes at least a step S102 for supplying a chemical solution for processing a film to be processed on a substrate to be treated to the top of the substrate to form a chemical solution film on the substrate and a step S104 for forming a flow of the chemical solution in the surface of the chemical solution film while holding the chemical solution film on the substrate by forming an airflow in such a way that it comes in contact with the surface of the chemical solution film after the step S102. |
