发明名称 METHOD FOR FORMING HOLE BY USING CARBON DIOXIDE GAS LASER AND ITS POST-TREATMENT METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for forming a hole for preventing contamination of a copper foil surface of a copper clad plate, when a hole is to be formed by using carbon dioxide gas laser. SOLUTION: After an etching film or liquid state etching resist is arranged on the surface of the copper clad plate, and only the portion of a target mark is developed, the surface copper foil is etched and eliminated. The target mark in this portion is read with a CCD camera, and the film or the resist is irradiated directly with a high output carbon oxide gas laser, preferably selected from 10-60 mJ, thereby working and removing an outer layer copper foil and an inner layer copper foil, and forming a through-hole and/or a blind via hole. Thus, the through-hole and/or the blind via hole can be formed directly using the carbon dioxide gas laser, in such a manner that the surface layer copper foil is not contaminated. A high density printed wiring board can be obtained, using the copper clad plate.</p>
申请公布号 JP2001230518(A) 申请公布日期 2001.08.24
申请号 JP20000038364 申请日期 2000.02.16
申请人 MITSUBISHI GAS CHEM CO INC 发明人 IKEGUCHI NOBUYUKI;KATO SADAHIRO
分类号 B23K26/00;B23K26/38;H05K1/02;H05K1/03;H05K3/00;H05K3/06;(IPC1-7):H05K3/00 主分类号 B23K26/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利