发明名称 SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To prevent a wafer from being oxidized by substitution of nitrogen gas, and to prevent natural oxidation in an atmosphere, with no special pressure- proof structure of a case and the like. SOLUTION: There are provided a reactive oven 4 where a wafer 12 held in a boat 6 is processed, a boat housing chamber 3 which is below the reactive over and houses the boat, wafer transportation equipment 9 which is provided outside the boat housing chamber and transports the wafer into the boat, and an opening 8 which is provided on the side of wafer transportation equipment of the boat housing chamber and opened/closed by an opening/closing means. Here, the wafer transportation equipment transport the water into the boat lowered from the reactive oven into the boat housing chamber through the opening which is opened.
申请公布号 JP2001230300(A) 申请公布日期 2001.08.24
申请号 JP20000386886 申请日期 2000.12.20
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 OZAWA MAKOTO
分类号 B65G49/00;B65G49/07;H01L21/205;H01L21/22;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
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