发明名称 Lapping method and method for manufacturing lapping particles for use in the lapping method
摘要 A method for lapping a material to be lapped is provided, in which the material contacts with a surface of a rotating lapping cloth. A lapping agent containing lapping particles is employed. The lapping particles have a hardness identical or equivalent to that of the material. The hardness is adjusted by controlling a concentration of the lapping particles. A method for manufacturing the lapping particles for use in the lapping method is also provided, in which a silane and an oxygen are injected in a gaseous phase to generate porous silica particles having a desired concentration.
申请公布号 US2001016468(A1) 申请公布日期 2001.08.23
申请号 US20010848331 申请日期 2001.05.04
申请人 KIKUTA KUNIKO 发明人 KIKUTA KUNIKO
分类号 B24B37/00;B24B37/04;C01B33/12;C09K3/14;H01L21/306;(IPC1-7):B24B1/00 主分类号 B24B37/00
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