发明名称 Process for forming abrasion-resistant antistatic layer for imaging element and imaging element containing said layer
摘要 A process for forming an abrasion-resistant antistatic layer for an imaging element comprises: adjusting the pH of an aqueous composition of an electronically-conductive polymer to a pH of about 3 to about 10, and combining the pH-adjusted aqueous composition of the electronically-conductive polymer with an aqueous composition at a pH greater than 7 of a polyurethane film-forming binder having a tensile elongation to break of at least 50% and a Young's modulus measured at 2% elongation of at least 50000 psi. The process further comprises applying the resulting coating composition to the imaging element, thereby forming an abrasion-resistant antistatic layer on the element. The antistatic layer coating composition of the present invention can be applied to a wide variety of imaging elements, including, for example, photographic, electrostatographic, photothermographic, migration, electrothermographic, dielectric recording and thermal-dye-transfer imaging elements.
申请公布号 US2001016303(A1) 申请公布日期 2001.08.23
申请号 US20000735018 申请日期 2000.12.12
申请人 MAJUMDAR DEBASIS;EICHORST DENNIS J.;TINGLER KENNETH L. 发明人 MAJUMDAR DEBASIS;EICHORST DENNIS J.;TINGLER KENNETH L.
分类号 B41M5/40;B41M5/41;B41M5/44;G03C1/76;G03C1/77;G03C1/775;G03C1/795;G03C1/89;G03G7/00;(IPC1-7):G03C1/89;H01B1/00;C08J3/02;C08K3/20 主分类号 B41M5/40
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