A resist composition which comprises (A) an alkali-soluble resin, (B) an ingredient which crosslinks the alkali-soluble resin upon irradiation with actinic rays or upon irradiation with actinic rays and subsequent heating, and (C) a compound absorbing actinic rays, characterized in that the alkali-soluble resin (A) is a resin composition comprising 30 to 95 wt.% polyvinylphenol and 5 to 70 wt.% novolac resin. Also provided is a method of forming a pattern with the resist composition.
