发明名称 |
Semiconductor wafer rinse device |
摘要 |
A device for rinsing batches of semiconductor wafers including a rinse vessel provided with at least one opening of overflowing water discharge, the bottom of which includes a water supply, a main outlet connected to a sewer and a recovery outlet connected to a waste water treatment plant, said at least one opening emerging into a gutter equipped with an outlet duct connected to the sewer and with a recovery duct connected to the treatment plant and said outlet duct being equipped with a controllable closing means enabling selection thereof to empty the gutter.
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申请公布号 |
US2001015215(A1) |
申请公布日期 |
2001.08.23 |
申请号 |
US20000731578 |
申请日期 |
2000.12.06 |
申请人 |
MASSICOT PATRICK;MARTIN JEAN-PIERRE |
发明人 |
MASSICOT PATRICK;MARTIN JEAN-PIERRE |
分类号 |
H01L21/00;(IPC1-7):B08B3/04 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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