发明名称 Semiconductor wafer rinse device
摘要 A device for rinsing batches of semiconductor wafers including a rinse vessel provided with at least one opening of overflowing water discharge, the bottom of which includes a water supply, a main outlet connected to a sewer and a recovery outlet connected to a waste water treatment plant, said at least one opening emerging into a gutter equipped with an outlet duct connected to the sewer and with a recovery duct connected to the treatment plant and said outlet duct being equipped with a controllable closing means enabling selection thereof to empty the gutter.
申请公布号 US2001015215(A1) 申请公布日期 2001.08.23
申请号 US20000731578 申请日期 2000.12.06
申请人 MASSICOT PATRICK;MARTIN JEAN-PIERRE 发明人 MASSICOT PATRICK;MARTIN JEAN-PIERRE
分类号 H01L21/00;(IPC1-7):B08B3/04 主分类号 H01L21/00
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