发明名称 |
Method for preparing the surface of a dielectric |
摘要 |
This invention relates to a method for improving the chemical and electrical performance characteristics of a dielectric material especially one with high dielectric constant. The method comprises the steps of first obtaining a high dielectric constant material, the material having a degraded upper surface reduced dielectric constant and then modifying the surface chemistry of said upper surface by reacting said upper surface with a reactant. The reaction enables removal of the degraded layer. In a variant of the method, the gas reactant preferentially reacting with upper surface as compared to the bulk.
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申请公布号 |
US2001016226(A1) |
申请公布日期 |
2001.08.23 |
申请号 |
US20010824385 |
申请日期 |
2001.04.02 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
NATZLE WESLEY;DUNCOMBE PETER R.;JAMMY RAJARAO;KOTECKI DAVID E.;LAIBOWITZ ROBERT B.;YU CHIENFAN |
分类号 |
H01L21/28;H01L21/311;H01L21/316;H01L29/51;(IPC1-7):B05D5/12;B05D3/04 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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