Method for analyzing circuit pattern defects and a system thereof

摘要

In order to allow critical flaws in an inspected item to be known early during a production process, the present invention includes the following steps: a step for detecting defects in a production process for the inspected item and storing defect positions; a step for collecting detailed defect information and storing the detailed information in association with defect positions; a step for storing positions at which flaws were generated based on a final inspection of the inspected item; a step for comparing defect positions with positions at which flaws were generated; and a step for classifying and displaying information based on the comparison results.