发明名称 PROCESS MONITORING SYSTEM FOR LITHOGRAPHY LASERS
摘要 <p>A system for a monitoring lithography laser (2) at least one integrated circuit fabrication plants. Each laser (2) at each fabrication plant has associated with it a terminal server (6). With respect to each fabrication plant a central control server unit (8) is in communication with each of the lasers (2) through a local area network (7). Information from the lasers (2) is collected by the central control server unit (8) and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.</p>
申请公布号 WO2001061514(A1) 申请公布日期 2001.08.23
申请号 US2001003762 申请日期 2001.02.05
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