发明名称 |
RADIATION CURE-TYPE ANTISTATIC RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation cure-type resin composition excellent in antistatic property and transparency and having high hardness. SOLUTION: A radiation cure-type antistatic resin composition features comprising (A) a polyfunctional urethaneacrylate obtained by reacting a radiation cure-type polyfunctional (meth)acrylate having two or more (meth)acryloyl groups and active hydrogens in a molecule with a polyisocyanate, (B) a zinc antimonate sol having a particle diameter measured by a BET(Brunauer-Emmett- Teller) method of <=18 nm and an average particle diameter measured by a dynamical scattering method of <=100 nm and (C) a polymer having a copolymerizable unsaturated double bond as an end group.
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申请公布号 |
JP2001226413(A) |
申请公布日期 |
2001.08.21 |
申请号 |
JP20000038914 |
申请日期 |
2000.02.17 |
申请人 |
NIPPON KAYAKU CO LTD |
发明人 |
KANO HIROKAZU;KIYOYANAGI NORIKO |
分类号 |
C08J5/18;C08F2/44;C08F2/50;C08F290/02;C08F299/06;C08K3/24;C08K7/18;(IPC1-7):C08F2/44 |
主分类号 |
C08J5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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