发明名称 RADIATION CURE-TYPE ANTISTATIC RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation cure-type resin composition excellent in antistatic property and transparency and having high hardness. SOLUTION: A radiation cure-type antistatic resin composition features comprising (A) a polyfunctional urethaneacrylate obtained by reacting a radiation cure-type polyfunctional (meth)acrylate having two or more (meth)acryloyl groups and active hydrogens in a molecule with a polyisocyanate, (B) a zinc antimonate sol having a particle diameter measured by a BET(Brunauer-Emmett- Teller) method of <=18 nm and an average particle diameter measured by a dynamical scattering method of <=100 nm and (C) a polymer having a copolymerizable unsaturated double bond as an end group.
申请公布号 JP2001226413(A) 申请公布日期 2001.08.21
申请号 JP20000038914 申请日期 2000.02.17
申请人 NIPPON KAYAKU CO LTD 发明人 KANO HIROKAZU;KIYOYANAGI NORIKO
分类号 C08J5/18;C08F2/44;C08F2/50;C08F290/02;C08F299/06;C08K3/24;C08K7/18;(IPC1-7):C08F2/44 主分类号 C08J5/18
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