| 摘要 |
An exposure apparatus includes a stage on which a substrate to be exposed is provided, a projection optical system for projecting a pattern onto the substrate and an aberration detection system for forming an image of a pattern of a mask formed by light passed through the projection optical system plural times, for detecting an intensity distribution of the image of the pattern of the mask, and for detecting a wavefront aberration of the projection optical system on the basis of the detected intensity distribution.
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