Carrier head with a flexible membrane for chemical mechanical polishing

摘要

A carrier head for a chemical mechanical polishing apparatus has a base, a flexible membrane extending beneath the base to define a pressurizable chamber, a support structure positioned in the chamber, and a spacer ring positioned outside the chamber. The flexible membrane includes a lower surface of the flexible membrane provides a mounting surface for a substrate, and a perimeter portion that extends in a serpentine path between the spacer ring the support structure.