| 摘要 |
PROBLEM TO BE SOLVED: To provide an acidic cleaning solution capable of suitably replenishing a surfactant for maintaining degreasing capacity and also capable of properly replenishing an oxidizer for reduction type ions for maintaining etching capacity and to provide a cleaning method therefor. SOLUTION: An acidic cleaning solution containing each component of sulfuric acid by 3,000 to 50,000 ppm, a surfactant by 100 to 5,000 ppm, oxidation type metallic ions or oxidation type metallic acid ions by 50 to 3,000 ppm and nitric acid by 100 to 5,000 ppm and performing treatment to an aluminum material is replenished with an A solution containing sulfuric acid by 30 to 500 pts.mass, a surfactant by 1 to 50 pts.mass, oxidation type metallic ions or oxidation type metallic acid ions by 0.5 to 30 pts.mass and water by 30 to 500 pts. mass and a B solution containing nitric acid by 0.5 to 30 pts.mass, an oxidizer by 0.5 to 30 pts.mass and water by 10 to 300 pts.mass to hold the concentration of each component to the above range.
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